New paper in J. Appl. Phys.


Journal of Applied Physics 131, 105102 (2022)

“Tuning of Curie temperature in Mn5Ge3 films”.
Y. Xie, M. Birowska, H. Simon Funk, I. A.Fischer, D. Schwarz, J. Schulze, Y.-J. Zeng, M. Helm, S. Zhou, S. Prucnal

Abstract:

We report a change in the structural and magnetic properties of epitaxial Mn$_5$Ge$_3$ on a Ge-on-Si (111) substrate by applying strain engineering through ms-range flashlamp annealing (FLA). X-ray diffraction results demonstrate that during FLA for 20 ms, the formation of nonmagnetic Mn$_x$Ge$_y$ secondary phases is fully suppressed, while the in-plane expansion of the lattice increases with increasing annealing temperature. Temperature-dependent magnetization results indicate that the Curie temperature of Mn5Ge3 rises from 287 K in the as-prepared sample to above 400 K after FLA, making Mn5Ge3 an attractive material for spintronics. Experimental results together with theoretical Monte Carlo simulations allow us to conclude that the expansion of the in-plane lattice causes the increase of the Curie temperature due to enhancement of the ferromagnetic interaction between Mn atoms.